RF Plasma Systems

for

Material Processing / Surface Treatment

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Researchers:

C.S. Wong , O.H. Chin, Roslan Md. Nor

Research students :

K.H. Ng (PhD)
  A.N. Lim (MSc)

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System 1: The Planar Coil RF ICP System for nitriding and TiN coating
(600W, 13.56MHz)

System 2: 2kW, 50-460kHz Planar Coil RF ICP System inside clean room

Cross-section of nitrided layer on AISI316 stainless steel sample.
A nitride layer of 10 um thick was formed in 2 hours with System 1 operated at 250W.

SEM of diamondlike carbon film coated on silicon substrate

                     Publications:

A LOW POWER PLANAR COIL INDUCTIVELY COUPLED PLASMA SYSTEM
Y.C. Kok and C.S. Wong, J. Fiz. Mal. 19, 31 (1998)

DIAMONDLIKE CARBON THIN FILM COATING ON SILICON SUBSTRATE USING A LOW POWER RF PLANAR COIL INDUCTIVELY COUPLED PLASMA
W.S. Liew and C.S. Wong, J. Fiz. Mal. 21, 27 (2000)

COATING OF TITANIUM NITRIDE THIN FILM ON STAINLESS STEEL USING AN RF PLANAr COIL INDUCTIVELY COUPLED PLASMA

S.P. Chew and C.S. Wong, Mal. J. Sci. 21, 107 (2002)

A PLANAR COIL INDUCTIVELY COUPLED PLASMA SYSTEM FOR THIN FILM DEPOSITION

K.H. Ng, W.S. Liew, Roslan Mohd. Nor and C.S. Wong, J. Fiz. Mal. 23, 51 (2002).

NITRIDING OF TITANIUM BY SPIRAL COIL RADIO FREQUENCY INDUCTIVELY COUPLED PLASMA

Abdul Hakim Hashim and C.S. Wong, J. Fiz. Mal. 23, 39 (2002).

SPECTRAL EMISSION ANALYSIS OF A DC HELIUM HOLLOW CATHODE DISCHARGE

O.H. Chin and C.S. Wong, J. Fiz. Mal. 24, 107 (2003)

SYNTHESIS OF DIAMOND THIN FILM USING HOT FILAMENT AND RF PLASMA CHEMICAL VAPOUR

DEPOSITION TECHNIQUE

C.H. Tan, K.H. Ng, R. Md. Nor and C.S. Wong, J. Fiz. Mal. 25, 103 (2004)